Analysis and design of a wide dynamic range pulse-frequency modulation CMOS image sensor

Complementary Metal-Oxide Semiconductor (CMOS) image sensor is the dominant electronic imaging device in many application fields, including the mobile or portable devices, teleconference cameras, surveillance and medical imaging sensors. Wide dynamic range (WDR) imaging is of interest particular, demonstrating a large-contrast imaging range of the sensor. As of today, different approaches have been presented to provide solutions for this purpose, but there exists various trade-offs among these designs, which limit the number of applications. A pulse-frequency modulation (PFM) pixel offers the possibility to outperform existing designs in WDR imaging applications, however issues such as uniformity and cost have to be carefully handled to make it practical for different purposes. In addition, a complete evaluation of the sensor performance has to be executed prior to fabrication in silicon technology.

A thorough investigation of WDR image sensor based on the PFM pixel is performed in this thesis. Starting with the analysis, modeling, and measurements of a PFM pixel, the details of every particular circuit operation are presented. The causes of dynamic range (DR) limitations and signal nonlinearity are identified, and noise measurement is also performed, to guide future design strategies. We present the design of an innovative double-delta compensating (DDC) technique which increases the sensor uniformity as well as DR. This technique achieves performance optimization of the PFM pixel with a minimal cost an improved linearity, and is carefully simulated to demonstrate its feasibility. A quad-sampling technique is also presented with the cooperation of pixel and column circuits to generate a WDR image sensor with a reduced cost for the pixel. This method, which is verified through the field-programmable gate array (FPGA) implementation, saves considerable area in the pixel and employs the maximal DR that a PFM pixel provides. A complete WDR image sensor structure is proposed to evaluate the performance and feasibility of fabrication in silicon technology. The plans of future work and possible improvements are also presented.